高純度バルク化学薬品

高純度バルク化学薬品

商品名 説明 お問い合わせ
Ammonium Fluoride (NH4F) SiO2 およびケイ酸塩材料のエッチングプロセスで使用されます。
Acetic Acid (CH3COOH) Used in photolithography and cleaning processes to remove organic residues and improve adhesion of photoresists.
n-Butyl Acetate (NBA) IC, Logic, Memory, MEMS
r-Butyrolactone (GBL) IC, Logic, Memory, MEMS
Butyl Diglycol (BDG) IC, Logic, Memory, MEMS
Dimethyl Sulfoxide (DMSO) IC, Logic, Memory, MEMS
Isopropanol (IPA) IC, Logic, Memory, MEMS
Methanol IC, Logic, Memory, MEMS
Monoethanolamine (MEA) IC, Logic, Memory, MEMS
n-Methyl-2-Pyrrolidone (NMP) IC, Logic, Memory, MEMS
Propylene Glycol Methyl Ether (PGME) IC, Logic, Memory, MEMS
Propylene Glycol Methyl Ether Acetate (PGMEA) IC, Logic, Memory, MEMS